Packet J: Tossup 14

Optimal pressures for this process can be determined using Brewster angle microscopy. Fine-tuning for one type of this process can be done using RHEED (“reed”) systems centered on an electron gun. Instabilities during this process can arise from misfit strain in the (10[1])Stranski–Krastanov (10[1])model of “island” coalescence. (10[1])Liquified petroleum gas and copper foils are used to produce (10[1])graphene in one form of this process. (10[2]-5[1])Material formed by this process (10[1])can be removed by reactive ion etching. (10[1])This (10[1]-5[1])process is done epitaxially (10[5]-5[1])with gallium (10[1])and arsenic molecular (10[1])beams (10[1]-5[2])in (-5[1])MOSFET (10[1]-5[2])(“moss-fet”) production. (10[2]-5[2])The chemical (-5[2])and physical (-5[3])vapor types (10[1]-5[2])of this (10[2])process (10[7])are (-5[1])used (10[4])to generate (10[1]-5[1])thin (10[1])films (10[3])for semiconductor (10[2]-5[1])wafers. (-5[1])For 10 points, (10[2])name this process of transferring (-5[1])gas particles onto a solid surface, (10[1]-5[2])the (10[1])opposite (10[1])of sublimation. (10[1])■END■ (10[24]0[12])

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